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Sinusoidal wavelength-scanning common-path interferometer with a beam-scanning system for measurement of film thickness variations
http://hdl.handle.net/10191/31153
http://hdl.handle.net/10191/31153c9152b71-8f2d-4eda-8438-dd4c3ab5a08a
| 名前 / ファイル | ライセンス | アクション |
|---|---|---|
7855_78550S.pdf (1.6 MB)
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| Item type | 会議発表論文 / Conference Paper(1) | |||||
|---|---|---|---|---|---|---|
| 公開日 | 2014-12-18 | |||||
| タイトル | ||||||
| タイトル | Sinusoidal wavelength-scanning common-path interferometer with a beam-scanning system for measurement of film thickness variations | |||||
| タイトル | ||||||
| タイトル | Sinusoidal wavelength-scanning common-path interferometer with a beam-scanning system for measurement of film thickness variations | |||||
| 言語 | en | |||||
| 言語 | ||||||
| 言語 | eng | |||||
| キーワード | ||||||
| 主題Scheme | Other | |||||
| 主題 | interferometer | |||||
| キーワード | ||||||
| 主題Scheme | Other | |||||
| 主題 | wavelength scanning | |||||
| キーワード | ||||||
| 主題Scheme | Other | |||||
| 主題 | sinusoidal phase modulation | |||||
| キーワード | ||||||
| 主題Scheme | Other | |||||
| 主題 | thickness measurement | |||||
| キーワード | ||||||
| 主題Scheme | Other | |||||
| 主題 | thin film | |||||
| 資源タイプ | ||||||
| 資源タイプ識別子 | http://purl.org/coar/resource_type/c_5794 | |||||
| 資源タイプ | conference paper | |||||
| 著者 |
Sasaki, Osami
× Sasaki, Osami× Morimatsu, Takafumi× Choi, Samuel× Suzuki, Takamasa |
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| 抄録 | ||||||
| 内容記述タイプ | Abstract | |||||
| 内容記述 | Two light beams reflected from a front and rear surfaces of a glass film of 20 micron thickness interfere with each other in a common path interferometer. Sinusoidal wavelength-scanning light with the scanning amplitude of 5 nm and frequency of 15 KHz is used to generate a sinusoidal phase-modulated interference signal with the modulation amplitude of 2.6 rad. The phase of the interference signal provides the thickness variation of the film, whose measurement accuracy is a few nanometers. Moreover, in order to achieve a high spatial resolution and a wide measurement region a focused beam is scanned on the surface of the film with a rotating mirror. | |||||
| 内容記述 | ||||||
| 内容記述タイプ | Other | |||||
| 内容記述 | Optical metrology and inspection for industrial applications : 18-20 October 2010 : Beijing, China. | |||||
| 書誌情報 |
Proceedings of SPIE - the International Society for Optical Engineering en : Proceedings of SPIE - the International Society for Optical Engineering 巻 7855, p. 78550S-1-78550S-6, 発行日 2010-11 |
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| 出版者 | ||||||
| 出版者 | International Society for Optical Engineering, SPIE | |||||
| ISSN | ||||||
| 収録物識別子タイプ | ISSN | |||||
| 収録物識別子 | 0277786X | |||||
| 書誌レコードID | ||||||
| 収録物識別子タイプ | NCID | |||||
| 収録物識別子 | AA10619755 | |||||
| DOI | ||||||
| 識別子タイプ | DOI | |||||
| 関連識別子 | info:doi/10.1117/12.871030 | |||||
| 権利 | ||||||
| 権利情報 | Copyright(C)2010 Society of Photo-Optical Instrumentation Engineers | |||||
| 著者版フラグ | ||||||
| 値 | publisher | |||||
