{"created":"2021-03-01T06:37:09.591891+00:00","id":31030,"links":{},"metadata":{"_buckets":{"deposit":"fb2963dc-41dd-4869-8066-b4caaee36423"},"_deposit":{"id":"31030","owners":[],"pid":{"revision_id":0,"type":"depid","value":"31030"},"status":"published"},"_oai":{"id":"oai:niigata-u.repo.nii.ac.jp:00031030","sets":["423:435:1827","453:457"]},"item_8_biblio_info_6":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2010-11","bibliographicIssueDateType":"Issued"},"bibliographicPageEnd":"78550S-6","bibliographicPageStart":"78550S-1","bibliographicVolumeNumber":"7855","bibliographic_titles":[{"bibliographic_title":"Proceedings of SPIE - the International Society for Optical Engineering"},{"bibliographic_title":"Proceedings of SPIE - the International Society for Optical Engineering","bibliographic_titleLang":"en"}]}]},"item_8_description_4":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"Two light beams reflected from a front and rear surfaces of a glass film of 20 micron thickness interfere with each other in a common path interferometer. Sinusoidal wavelength-scanning light with the scanning amplitude of 5 nm and frequency of 15 KHz is used to generate a sinusoidal phase-modulated interference signal with the modulation amplitude of 2.6 rad. The phase of the interference signal provides the thickness variation of the film, whose measurement accuracy is a few nanometers. Moreover, in order to achieve a high spatial resolution and a wide measurement region a focused beam is scanned on the surface of the film with a rotating mirror.","subitem_description_type":"Abstract"}]},"item_8_description_5":{"attribute_name":"内容記述","attribute_value_mlt":[{"subitem_description":"Optical metrology and inspection for industrial applications : 18-20 October 2010 : Beijing, China.","subitem_description_type":"Other"}]},"item_8_publisher_7":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"International Society for Optical Engineering, SPIE"}]},"item_8_relation_14":{"attribute_name":"DOI","attribute_value_mlt":[{"subitem_relation_type_id":{"subitem_relation_type_id_text":"info:doi/10.1117/12.871030","subitem_relation_type_select":"DOI"}}]},"item_8_rights_15":{"attribute_name":"権利","attribute_value_mlt":[{"subitem_rights":"Copyright(C)2010 Society of Photo-Optical Instrumentation Engineers"}]},"item_8_select_19":{"attribute_name":"著者版フラグ","attribute_value_mlt":[{"subitem_select_item":"publisher"}]},"item_8_source_id_11":{"attribute_name":"書誌レコードID","attribute_value_mlt":[{"subitem_source_identifier":"AA10619755","subitem_source_identifier_type":"NCID"}]},"item_8_source_id_9":{"attribute_name":"ISSN","attribute_value_mlt":[{"subitem_source_identifier":"0277786X","subitem_source_identifier_type":"ISSN"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"Sasaki, Osami"}],"nameIdentifiers":[{"nameIdentifier":"169387","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Morimatsu, Takafumi"}],"nameIdentifiers":[{"nameIdentifier":"169388","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Choi, Samuel"}],"nameIdentifiers":[{"nameIdentifier":"169389","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Suzuki, Takamasa"}],"nameIdentifiers":[{"nameIdentifier":"39","nameIdentifierScheme":"WEKO"}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2019-08-26"}],"displaytype":"detail","filename":"7855_78550S.pdf","filesize":[{"value":"1.6 MB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"7855_78550S.pdf","url":"https://niigata-u.repo.nii.ac.jp/record/31030/files/7855_78550S.pdf"},"version_id":"c345ef7c-d67a-47cc-b0e5-b998cdf99f0f"}]},"item_keyword":{"attribute_name":"キーワード","attribute_value_mlt":[{"subitem_subject":"interferometer","subitem_subject_scheme":"Other"},{"subitem_subject":"wavelength scanning","subitem_subject_scheme":"Other"},{"subitem_subject":"sinusoidal phase modulation","subitem_subject_scheme":"Other"},{"subitem_subject":"thickness measurement","subitem_subject_scheme":"Other"},{"subitem_subject":"thin film","subitem_subject_scheme":"Other"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"eng"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"conference paper","resourceuri":"http://purl.org/coar/resource_type/c_5794"}]},"item_title":"Sinusoidal wavelength-scanning common-path interferometer with a beam-scanning system for measurement of film thickness variations","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"Sinusoidal wavelength-scanning common-path interferometer with a beam-scanning system for measurement of film thickness variations"},{"subitem_title":"Sinusoidal wavelength-scanning common-path interferometer with a beam-scanning system for measurement of film thickness variations","subitem_title_language":"en"}]},"item_type_id":"8","owner":"1","path":["457","1827"],"pubdate":{"attribute_name":"公開日","attribute_value":"2014-12-18"},"publish_date":"2014-12-18","publish_status":"0","recid":"31030","relation_version_is_last":true,"title":["Sinusoidal wavelength-scanning common-path interferometer with a beam-scanning system for measurement of film thickness variations"],"weko_creator_id":"1","weko_shared_id":null},"updated":"2022-12-15T04:01:33.927904+00:00"}