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Beam scanning laser interferometer with high spatial resolution over a large field of view
http://hdl.handle.net/10191/31150
http://hdl.handle.net/10191/311509f53732c-ea06-4fbc-afcd-9bb3c843772e
名前 / ファイル | ライセンス | アクション |
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8201_82010J.pdf (3.3 MB)
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Item type | 会議発表論文 / Conference Paper(1) | |||||
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公開日 | 2014-12-18 | |||||
タイトル | ||||||
タイトル | Beam scanning laser interferometer with high spatial resolution over a large field of view | |||||
タイトル | ||||||
言語 | en | |||||
タイトル | Beam scanning laser interferometer with high spatial resolution over a large field of view | |||||
言語 | ||||||
言語 | eng | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | beam scanning | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | interferometer | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | sinusoidal phase-modulation | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | polarization interferometry | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | surface profile measurement | |||||
資源タイプ | ||||||
資源 | http://purl.org/coar/resource_type/c_5794 | |||||
タイプ | conference paper | |||||
著者 |
Sasaki, Osami
× Sasaki, Osami× Saito, Tsuyoshi× Choi, Samuel× Suzuki, Takamasa |
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抄録 | ||||||
内容記述タイプ | Abstract | |||||
内容記述 | It is difficult in interferometric metrology to maintain high spatial resolution over a large field of view. In this paper this characteristic is achieved by scanning two focused laser beams over an object surface and a reference mirror surface, respectively, with a rotating mirror, a lens, and a polarization beam splitter. An electric-optic phase modulator generates the phase difference of a sinusoidal waveform of 10 MHz between the two focused beams. Sinusoidal phase-modulating interferometry is used to calculate the phase of the interference signal caused by the two focused beams. The scanning speed of the beams is 20 m/s, and the sampling interval of the interference signal is 1/80 microseconds. The spatial resolution is 2.0 microns over the measurement region of 18.8mm. The measurement results show that the measurement error is less than 5nm. | |||||
内容記述 | ||||||
内容記述タイプ | Other | |||||
内容記述 | Optoelectronic measurement technology and systems : 6-9 November 2011 : Beijing, China | |||||
書誌情報 |
Proceedings of SPIE - the International Society for Optical Engineering en : Proceedings of SPIE - the International Society for Optical Engineering 巻 8201, p. 82010J-1-82010J-7, 発行日 2011-11 |
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出版者 | ||||||
出版者 | International Society for Optical Engineering, SPIE | |||||
ISSN | ||||||
収録物識別子タイプ | ISSN | |||||
収録物識別子 | 0277786X | |||||
書誌レコードID | ||||||
収録物識別子タイプ | NCID | |||||
収録物識別子 | AA10619755 | |||||
DOI | ||||||
識別子タイプ | DOI | |||||
関連識別子 | info:doi/10.1117/12.910102 | |||||
権利 | ||||||
権利情報 | Copyright(C)2011 Society of Photo-Optical Instrumentation Engineers | |||||
著者版フラグ | ||||||
値 | publisher |