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Temperature dependence of the sticking probability and molecular size of the film growth species in an atmospheric chemical vapor deposition process to form AlN from AlCl3 and NH3
http://hdl.handle.net/10191/30427
http://hdl.handle.net/10191/30427b8c44a0c-73de-4deb-a9c5-d7e9f884c364
名前 / ファイル | ライセンス | アクション |
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Item type | 学術雑誌論文 / Journal Article(1) | |||||
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公開日 | 2014-11-17 | |||||
タイトル | ||||||
タイトル | Temperature dependence of the sticking probability and molecular size of the film growth species in an atmospheric chemical vapor deposition process to form AlN from AlCl3 and NH3 | |||||
言語 | en | |||||
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言語 | eng | |||||
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資源タイプ識別子 | http://purl.org/coar/resource_type/c_6501 | |||||
資源タイプ | journal article | |||||
著者 |
Kim, H.J.
× Kim, H.J.× Egashira, Y.× Komiyama, H. |
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抄録 | ||||||
内容記述タイプ | Abstract | |||||
内容記述 | The sticking probability and molecular size of the growth species were determined as a function of deposition temperature ranging from 700 to 950℃, in the AIN films prepared from A1C13 and NH3. A novel method was developed, that includes the measurement of the film thickness profile on micron-sized trenches and the molecular diffusivity of the growth species. The molecular size was about 1 nm at 700-850℃ and decreased gradually with increasing temperature. The sticking probability increased from 0.02 to 0.5 in the temperature range 700-950℃ and, surprisingly, obeyed the Arrhenius law in spite of this large probability of sticking. The activation energy amounted to 136 kJ/mol. | |||||
言語 | en | |||||
書誌情報 |
en : Applied Physics Letters 巻 59, 号 20, p. 2521-2523, 発行日 1991-11 |
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出版者 | American Institute of Physics | |||||
言語 | en | |||||
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収録物識別子タイプ | ISSN | |||||
収録物識別子 | 0003-6951 | |||||
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収録物識別子タイプ | NCID | |||||
収録物識別子 | AA00543431 | |||||
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識別子タイプ | DOI | |||||
関連識別子 | http://doi.org/10.1063/1.106406 | |||||
権利 | ||||||
権利情報 | Copyright(C)1991American Institute of Physics | |||||
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出版タイプ | VoR | |||||
出版タイプResource | http://purl.org/coar/version/c_970fb48d4fbd8a85 | |||||
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値 | publisher |