{"created":"2021-03-01T06:05:13.136017+00:00","id":1548,"links":{},"metadata":{"_buckets":{"deposit":"32765aff-2c12-4aa5-895b-08fda1bbd88f"},"_deposit":{"id":"1548","owners":[],"pid":{"revision_id":0,"type":"depid","value":"1548"},"status":"published"},"_oai":{"id":"oai:niigata-u.repo.nii.ac.jp:00001548","sets":["423:424:425","453:454"]},"author_link":["4232","4233","4234"],"control_number":"1548","item_1627363077551":{"attribute_name":"出版タイプ","attribute_value_mlt":[{"subitem_version_resource":"http://purl.org/coar/version/c_970fb48d4fbd8a85","subitem_version_type":"VoR"}]},"item_5_biblio_info_6":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"1991-11","bibliographicIssueDateType":"Issued"},"bibliographicIssueNumber":"20","bibliographicPageEnd":"2523","bibliographicPageStart":"2521","bibliographicVolumeNumber":"59","bibliographic_titles":[{"bibliographic_title":"Applied Physics Letters","bibliographic_titleLang":"en"}]}]},"item_5_description_4":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"The sticking probability and molecular size of the growth species were determined as a function of deposition temperature ranging from 700 to 950℃, in the AIN films prepared from A1C13 and NH3. A novel method was developed, that includes the measurement of the film thickness profile on micron-sized trenches and the molecular diffusivity of the growth species. The molecular size was about 1 nm at 700-850℃ and decreased gradually with increasing temperature. The sticking probability increased from 0.02 to 0.5 in the temperature range 700-950℃ and, surprisingly, obeyed the Arrhenius law in spite of this large probability of sticking. The activation energy amounted to 136 kJ/mol.","subitem_description_language":"en","subitem_description_type":"Abstract"}]},"item_5_publisher_7":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"American Institute of Physics","subitem_publisher_language":"en"}]},"item_5_relation_14":{"attribute_name":"DOI","attribute_value_mlt":[{"subitem_relation_type_id":{"subitem_relation_type_id_text":"http://doi.org/10.1063/1.106406","subitem_relation_type_select":"DOI"}}]},"item_5_rights_15":{"attribute_name":"権利","attribute_value_mlt":[{"subitem_rights":"Copyright(C)1991American Institute of Physics"}]},"item_5_select_19":{"attribute_name":"著者版フラグ","attribute_value_mlt":[{"subitem_select_item":"publisher"}]},"item_5_source_id_11":{"attribute_name":"書誌レコードID","attribute_value_mlt":[{"subitem_source_identifier":"AA00543431","subitem_source_identifier_type":"NCID"}]},"item_5_source_id_9":{"attribute_name":"ISSN","attribute_value_mlt":[{"subitem_source_identifier":"0003-6951","subitem_source_identifier_type":"ISSN"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"Kim, H.J.","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"4232","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Egashira, Y.","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"4233","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Komiyama, H.","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"4234","nameIdentifierScheme":"WEKO"}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2019-07-29"}],"displaytype":"detail","filename":"59_20_2521-2523.pdf","filesize":[{"value":"296.8 kB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"59_20_2521-2523.pdf","url":"https://niigata-u.repo.nii.ac.jp/record/1548/files/59_20_2521-2523.pdf"},"version_id":"d866787d-68a3-43a5-92ee-9c771d10fdf4"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"eng"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"journal article","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"Temperature dependence of the sticking probability and molecular size of the film growth species in an atmospheric chemical vapor deposition process to form AlN from AlCl3 and NH3","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"Temperature dependence of the sticking probability and molecular size of the film growth species in an atmospheric chemical vapor deposition process to form AlN from AlCl3 and NH3","subitem_title_language":"en"}]},"item_type_id":"5","owner":"1","path":["454","425"],"pubdate":{"attribute_name":"PubDate","attribute_value":"2014-11-17"},"publish_date":"2014-11-17","publish_status":"0","recid":"1548","relation_version_is_last":true,"title":["Temperature dependence of the sticking probability and molecular size of the film growth species in an atmospheric chemical vapor deposition process to form AlN from AlCl3 and NH3"],"weko_creator_id":"1","weko_shared_id":-1},"updated":"2022-12-15T03:34:15.405408+00:00"}