@article{oai:niigata-u.repo.nii.ac.jp:00001548,
 author = {Kim, H.J. and Egashira, Y. and Komiyama, H.},
 issue = {20},
 journal = {Applied Physics Letters},
 month = {Nov},
 note = {The sticking probability and molecular size of the growth species were determined as a function of deposition temperature ranging from 700 to 950℃, in the AIN films prepared from A1C13 and NH3. A novel method was developed, that includes the measurement of the film thickness profile on micron-sized trenches and the molecular diffusivity of the growth species. The molecular size was about 1 nm at 700-850℃ and decreased gradually with increasing temperature. The sticking probability increased from 0.02 to 0.5 in the temperature range 700-950℃ and, surprisingly, obeyed the Arrhenius law in spite of this large probability of sticking. The activation energy amounted to 136 kJ/mol.},
 pages = {2521--2523},
 title = {Temperature dependence of the sticking probability and molecular size of the film growth species in an atmospheric chemical vapor deposition process to form AlN from AlCl3 and NH3},
 volume = {59},
 year = {1991}
}