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CVD方法によるAlN膜合成のメカニズムと制御 (<特集>窒化アルミニウム(AlN))
http://hdl.handle.net/10191/30432
c4e4fc30-89ca-4d04-b827-aa5870ae1001
名前 / ファイル | ライセンス | アクション | |
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Item type | 学術雑誌論文 / Journal Article(1) | |||||
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公開日 | 2014-11-18 | |||||
タイトル | ||||||
タイトル | CVD方法によるAlN膜合成のメカニズムと制御 (<特集>窒化アルミニウム(AlN)) | |||||
タイトル | ||||||
言語 | en | |||||
タイトル | CVD方法によるAlN膜合成のメカニズムと制御 (<特集>窒化アルミニウム(AlN)) | |||||
言語 | ||||||
言語 | jpn | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | AlN | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | Chemical vapor deposition | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | Cluster size | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | Sticking probability | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | Orientation | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | Particle | |||||
資源タイプ | ||||||
資源 | http://purl.org/coar/resource_type/c_6501 | |||||
タイプ | journal article | |||||
その他のタイトル | ||||||
その他のタイトル | Study of Mechanism to Control the AlN Film Synthesis by Chemical Vapor Deposition | |||||
著者 |
小宮山, 宏
× 小宮山, 宏× 金, 煕濬× 大沢, 利男× 江頭, 靖幸 |
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著者別名 | ||||||
識別子 | ||||||
識別子 | 38463 | |||||
識別子Scheme | WEKO | |||||
姓名 | ||||||
姓名 | KOMIYAMA, Hiroshi | |||||
著者別名 | ||||||
識別子 | ||||||
識別子 | 38464 | |||||
識別子Scheme | WEKO | |||||
姓名 | ||||||
姓名 | KIM, Hee Joon | |||||
著者別名 | ||||||
識別子 | ||||||
識別子 | 38465 | |||||
識別子Scheme | WEKO | |||||
姓名 | ||||||
姓名 | OSAWA, Toshio | |||||
著者別名 | ||||||
識別子 | ||||||
識別子 | 38466 | |||||
識別子Scheme | WEKO | |||||
姓名 | ||||||
姓名 | EGASHIRA, Yasuyuki | |||||
書誌情報 |
セラミックス en : セラミックス 巻 26, 号 8, p. 759-763, 発行日 1991-03 |
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出版者 | ||||||
出版者 | 日本セラミックス協会 | |||||
ISSN | ||||||
収録物識別子タイプ | ISSN | |||||
収録物識別子 | 0009031X | |||||
書誌レコードID | ||||||
収録物識別子タイプ | NCID | |||||
収録物識別子 | AN00131516 | |||||
権利 | ||||||
権利情報 | Copyright(C)1991 日本セラミックス協会 | |||||
著者版フラグ | ||||||
値 | publisher |