{"created":"2021-03-01T06:37:12.069132+00:00","id":31067,"links":{},"metadata":{"_buckets":{"deposit":"16c30dd2-8489-4472-a9a7-4deabfeeafa3"},"_deposit":{"id":"31067","owners":[],"pid":{"revision_id":0,"type":"depid","value":"31067"},"status":"published"},"_oai":{"id":"oai:niigata-u.repo.nii.ac.jp:00031067","sets":["423:435:1827","453:457"]},"item_8_biblio_info_6":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"1999-06","bibliographicIssueDateType":"Issued"},"bibliographicPageEnd":"621","bibliographicPageStart":"618","bibliographicVolumeNumber":"3740","bibliographic_titles":[{"bibliographic_title":"Proceedings of SPIE - the International Society for Optical Engineering"},{"bibliographic_title":"Proceedings of SPIE - the International Society for Optical Engineering","bibliographic_titleLang":"en"}]}]},"item_8_description_4":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"We propose an interferometric reflectometry using a sinusoidal wavelength-scanning tunable laser diode to detect positions and profiles of multiple reflecting surfaces. An objective signal extracted from an interference signal contains the modulation amplitude Z and the phase (alpha) which are related to positions and profiles of multiple reflecting surfaces, respectively. By using values of the object signal at special times, we can produce an image intensity which shows where the reflecting surfaces exist. To obtain exact values of Z or values of (alpha) the objective signal is estimated with a conjugate gradient method. Experiments results show that a resolution of two-optical path difference (OPD) in the image intensity is 87 micrometer, and a final OPD accuracy is 2 micrometer and 8 micrometer for the two and three reflecting surfaces, respectively, in the case of the wavelength-scanning width of 7 nm. Profiles of front and rear surfaces of a silica glass plate with thickness of 20 micrometer are measured with an accuracy of about 10 nm.","subitem_description_type":"Abstract"}]},"item_8_description_5":{"attribute_name":"内容記述","attribute_value_mlt":[{"subitem_description":"Optical engineering for sensing and nanotechnology : International conference on optical sensing and nanotechnology : Jun 1999, Yokohama, Japan","subitem_description_type":"Other"}]},"item_8_publisher_7":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"International Society for Optical Engineering, SPIE"}]},"item_8_relation_14":{"attribute_name":"DOI","attribute_value_mlt":[{"subitem_relation_type_id":{"subitem_relation_type_id_text":"info:doi/10.1117/12.347759","subitem_relation_type_select":"DOI"}}]},"item_8_rights_15":{"attribute_name":"権利","attribute_value_mlt":[{"subitem_rights":"Copyright 1999 Society of Photo-Optical Instrumentation Engineers. One print or electronic copy may be made for personal use only. Systematic reproduction and distribution, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper are prohibited."}]},"item_8_select_19":{"attribute_name":"著者版フラグ","attribute_value_mlt":[{"subitem_select_item":"publisher"}]},"item_8_source_id_11":{"attribute_name":"書誌レコードID","attribute_value_mlt":[{"subitem_source_identifier":"AA10619755","subitem_source_identifier_type":"NCID"}]},"item_8_source_id_9":{"attribute_name":"ISSN","attribute_value_mlt":[{"subitem_source_identifier":"0277786X","subitem_source_identifier_type":"ISSN"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"Sasaki, Osami"}],"nameIdentifiers":[{"nameIdentifier":"169521","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Kuwahara, Tomokazu"}],"nameIdentifiers":[{"nameIdentifier":"169522","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Hara, Ryohta"}],"nameIdentifiers":[{"nameIdentifier":"169523","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Suzuki, Takamasa"}],"nameIdentifiers":[{"nameIdentifier":"39","nameIdentifierScheme":"WEKO"}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2019-08-26"}],"displaytype":"detail","filename":"3740_618-621.pdf","filesize":[{"value":"400.3 kB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"3740_618-621.pdf","url":"https://niigata-u.repo.nii.ac.jp/record/31067/files/3740_618-621.pdf"},"version_id":"2c16d400-2204-4516-8e1b-1f2a7cacf740"}]},"item_keyword":{"attribute_name":"キーワード","attribute_value_mlt":[{"subitem_subject":"reflectometry","subitem_subject_scheme":"Other"},{"subitem_subject":"nterferometry","subitem_subject_scheme":"Other"},{"subitem_subject":"wavelength scanning","subitem_subject_scheme":"Other"},{"subitem_subject":"thickness measurement","subitem_subject_scheme":"Other"},{"subitem_subject":"surface profile measurement","subitem_subject_scheme":"Other"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"eng"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"conference paper","resourceuri":"http://purl.org/coar/resource_type/c_5794"}]},"item_title":"Sinusoidal wavelength-scanning interferometric reflectometry","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"Sinusoidal wavelength-scanning interferometric reflectometry"},{"subitem_title":"Sinusoidal wavelength-scanning interferometric reflectometry","subitem_title_language":"en"}]},"item_type_id":"8","owner":"1","path":["457","1827"],"pubdate":{"attribute_name":"公開日","attribute_value":"2014-06-20"},"publish_date":"2014-06-20","publish_status":"0","recid":"31067","relation_version_is_last":true,"title":["Sinusoidal wavelength-scanning interferometric reflectometry"],"weko_creator_id":"1","weko_shared_id":null},"updated":"2022-12-15T04:01:35.915668+00:00"}