@article{oai:niigata-u.repo.nii.ac.jp:00001631,
 author = {Miyakawa, Osamu and Watanabe, Kouichi and Okawa, Seigo and Kanatani, Mitsugu and Nakano, Syuji and Kobayashi, Masayoshi},
 issue = {1},
 journal = {Dental Materials Journal},
 month = {Jan},
 note = {This study investigated the contamination of abraded Ti surfaces. Using a polishing machine, specimens were abraded with waterproof SiC grif papers under water cooling. The abraded surfaces were examined using element analysis, X-ray diffraction, and hardness tests. Contaminant deposits with dimensions reaching about 30 μm were observed throughout the surface. In these deposits, Ti was apparently reduced by about 10% and replaced by Si and O. The chemical bond state of the Si was similar to that of SiC or a titanium silicide. The O was solute in Ti, which increased the surface hardness. The contaminant deposits were amorphous or very thin. The contamination of Ti, the extent of which was related to hardness, resulted from a reaction with abrasives., チタン研磨面の汚染について検討した.研磨装置により,SiC耐水研磨紙を用いて水冷下で研磨し,研磨面の元素分析,X線回折,硬さ測定を行った.10∼30μmの大きさの汚染物様のものが研磨面全体に観察された.そこでのTiの見かけの濃度は約10%低下し,SiとOの濃度が高かった.Siの結合状態はSiCの結合状態はSiCまたはTi-Si化合物のそれに似ていた.Oは固溶酸素として存在し,研磨面を硬化させた.汚染物は非晶質か,あるいは非常に薄いことが示唆さりた.このようなチタンの汚染は,その硬さとも無関係ではないが,研磨材との何らかの反応によると考えられる.},
 pages = {11--21},
 title = {Surface Contamination of Titanium by Abrading Treatment},
 volume = {15},
 year = {1996}
}