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Chemical mechanical polishing of titanium with colloidal silica containing hydrogen peroxide : mirror polishing and surface properties
http://hdl.handle.net/10191/18167
http://hdl.handle.net/10191/181677516d8a2-7fbb-48f4-ad92-e43d5b94e889
名前 / ファイル | ライセンス | アクション |
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28_1_68-74.pdf (1.2 MB)
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Item type | 学術雑誌論文 / Journal Article(1) | |||||
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公開日 | 2012-06-04 | |||||
タイトル | ||||||
言語 | en | |||||
タイトル | Chemical mechanical polishing of titanium with colloidal silica containing hydrogen peroxide : mirror polishing and surface properties | |||||
言語 | ||||||
言語 | eng | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | Chemical mechanical polishing | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | Titanium | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | XPS | |||||
資源タイプ | ||||||
資源 | http://purl.org/coar/resource_type/c_6501 | |||||
タイプ | journal article | |||||
著者 |
Okawa, Seigo
× Okawa, Seigo× Watanabe, Kouichi |
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抄録 | ||||||
内容記述タイプ | Abstract | |||||
内容記述 | Chemical mechanical polishing (CMP) of cpTi (Ti) was carried out using two types of slurries, acidic and basic colloidal silica containing H_2O_2 up to 3wt%, to obtain flat and mirror-polished surfaces without any contaminated and reacted layers. Polishing behavior and surface properties were investigated using AFM, EPMA, and XPS. Weight loss of Ti polished by CMP using the basic slurry was larger than that using the acidic one, and surface roughness was less than 2nm RMS when basic slurry containing 3 wt% H_2O_2 was used. Moreover, three kinds of chemical species, OH^-, O^<2->, and H_2O, were detected on the Ti surfaces polished by CMP using these slurries. Results of this study showed that CMP using colloidal silica containing H_2O_2 successfully created a mirror-polished surface without contaminated and reacted layers. | |||||
言語 | en | |||||
書誌情報 |
en : Dental Materials Journal 巻 28, 号 1, p. 68-74, 発行日 2009-01 |
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出版者 | ||||||
言語 | ja | |||||
出版者 | 日本歯科理工学会 | |||||
ISSN | ||||||
収録物識別子タイプ | ISSN | |||||
収録物識別子 | 0287-4547 | |||||
書誌レコードID | ||||||
収録物識別子タイプ | NCID | |||||
収録物識別子 | AA10443149 | |||||
DOI | ||||||
識別子タイプ | DOI | |||||
関連識別子 | http://doi.org/10.4012/dmj.28.68 | |||||
権利 | ||||||
権利情報 | 日本歯科理工学会 | |||||
権利 | ||||||
権利情報 | 本文データは学協会の許諾に基づきCiNiiから複製したものである | |||||
出版タイプ | ||||||
出版タイプ | VoR | |||||
出版タイプResource | http://purl.org/coar/version/c_970fb48d4fbd8a85 | |||||
著者版フラグ | ||||||
値 | publisher | |||||
異版である | ||||||
関連タイプ | isVersionOf | |||||
識別子タイプ | URI | |||||
関連識別子 | http://ci.nii.ac.jp/naid/110007041976 |