A halogen lamp and an acousto-optic tunable filter are used to construct a sinusoidal wavelength-scanning interferometer with the scanning width of 210 nm. A linear wavelength-scanning with the scanning width of 220 nm is utilized to determine amplitudes of three different interference signals produced from multiple-reflection lights by front and rear surfaces of a thin film. Amplitudes of time-varying phases produced by a sinusoidal wavelength-scanning and constant phases in the interference signals are estimated by minimizing a difference between detected signals and theoretical ones. From the estimated values, the positions of the front and rear surface of the thin film with a thickness of about 460 nm are measured with an error less than 4 nm.
内容記述
2009 international conference on optical instruments and technology : optoelectronic measurement technology and systems : 19-22 October 2009 : Shanghai, China. : 2009 international conference on optical instrument and technology : OIT’09 : Oct 2009, Shanghai, China
雑誌名
Proceedings of SPIE - the International Society for Optical Engineering
巻
7511
ページ
75110B-1 - 75110B-7
発行年
2009-11
出版者
International Society for Optical Engineering, SPIE
ISSN
0277786X
書誌レコードID
AA10619755
DOI
info:doi/10.1117/12.840190
権利
Copyright 2009 Society of Photo-Optical Instrumentation Engineers. One print or electronic copy may be made for personal use only. Systematic reproduction and distribution, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper are prohibited.
Measurement of thin film shape with a sinusoidal wavelength scanning interferometer using a white light source
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