Two light beams reflected from a front and rear surfaces of a glass film of 20 micron thickness interfere with each other in a common path interferometer. Sinusoidal wavelength-scanning light with the scanning amplitude of 5 nm and frequency of 15 KHz is used to generate a sinusoidal phase-modulated interference signal with the modulation amplitude of 2.6 rad. The phase of the interference signal provides the thickness variation of the film, whose measurement accuracy is a few nanometers. Moreover, in order to achieve a high spatial resolution and a wide measurement region a focused beam is scanned on the surface of the film with a rotating mirror.
内容記述
Optical metrology and inspection for industrial applications : 18-20 October 2010 : Beijing, China.
雑誌名
Proceedings of SPIE - the International Society for Optical Engineering
巻
7855
ページ
78550S-1 - 78550S-6
発行年
2010-11
出版者
International Society for Optical Engineering, SPIE
ISSN
0277786X
書誌レコードID
AA10619755
DOI
info:doi/10.1117/12.871030
権利
Copyright(C)2010 Society of Photo-Optical Instrumentation Engineers
Sinusoidal wavelength-scanning common-path interferometer with a beam-scanning system for measurement of film thickness variations
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